Processing method based on resist pattern formation, and resist

Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Post imaging process – finishing – or perfecting composition...

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430306, G03G 1316

Patent

active

055761356

ABSTRACT:
A processing method based on resist pattern formation, includes the steps of forming an electrostatic latent image on a photosensitive rotating drum, forming a toner image on the drum by developing the electrostatic latent image with a hot-melt toner, transferring the toner image on the drum onto a processing target member made of a material that is dissolved by an etchant, in accordance with hot-melt transfer, and processing the processing target member based on the toner image thereon as a resist pattern. The processing step has an etching step of causing the etchant to act on a surface of the processing target member on which the resist pattern has been transferred, thereby selectively etching the surface of the processing target member.

REFERENCES:
patent: 3374769 (1968-03-01), Carlson
patent: 4226930 (1980-10-01), Takimoto et al.
patent: 4371599 (1983-02-01), Lind et al.
patent: 4684547 (1987-08-01), DiStefano et al.
patent: 4991287 (1991-02-01), Piatt et al.

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