Processing method and apparatus using focused ion beam generatin

Details Processing method and apparatus using focused ion beam generatin Processing method and apparatus using focused ion beam generatin

1996-11-08

1998-10-20

Nguyen, Kiet T.

Radiant energy

Ion generation

Field ionization type

25049221, 31511141, 31511181, H01J 37317

Patent

active

058250352

ABSTRACT:
A processing method using a plasma ion source for generating a focused ion beam, characterized by covering, with an insulator, an inner wall of a plasma holding vessel excluding a reference electrode for applying a voltage to a plasma and an ion extraction electrode for extracting ions from the plasma, and employing means of continuously controlling the absolute value of an ion beam current in a range of from 1 to 10 .mu.A by changing the absolute value of an ion extraction voltage applied between the reference electrode and the ion extraction electrode in a range of from 0 to 100 V; and an apparatus for carrying out the processing method. This is advantageous in stabilizing the ion beam current and in preventing the ion beam from being made dim even when the current value of the ion beam is changed.

REFERENCES:
patent: 3955091 (1976-05-01), Robinson et al.
patent: 5017835 (1991-05-01), Oechsner
patent: 5198718 (1993-03-01), Davis et al.
patent: 5616921 (1997-04-01), Talbot et al.

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