Processing method and apparatus thereof

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

1566401, 1566441, 118731, 118719, C23F 102

Patent

active

054746418

ABSTRACT:
The present invention relates to a processing chamber that processes an object to be processed in an atmosphere of a processing gas. The processing chamber is provided with a mounting stand having a holder mechanism that holds the object to be processed within the processing chamber. The mounting stand is connected to a rotational mechanism and is free to rotate, and the holder mechanism on the mounting stand is also provided with a separate, independent rotational mechanism whereby the front surface and rear surface of the object to be processed can be rotated (inverted) relative to the mounting stand. Thus the present invention provides a processing method and apparatus therefor in which the front surface and rear surface of the object to be processed can be processed under the same conditions, without having to change the atmospheric status of the object to be processed.

REFERENCES:
patent: 4817559 (1989-04-01), Ciparisso
patent: 5135608 (1992-08-01), Okutani
patent: 5171393 (1992-12-01), Moffat
patent: 5174855 (1992-12-01), Tanaka
patent: 5176783 (1993-01-01), Yoshikawa
patent: 5200017 (1993-04-01), Kawasaki
patent: 5227001 (1993-07-01), Tamaki
patent: 5248380 (1993-09-01), Tanaka
patent: 5308447 (1994-05-01), Lewis
patent: 5336356 (1994-08-01), Ban
patent: 5372647 (1994-12-01), Ohmi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Processing method and apparatus thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Processing method and apparatus thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing method and apparatus thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1357573

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.