Processing equipment of single substrate transfer type

Details Processing equipment of single substrate transfer type Processing equipment of single substrate transfer type

1995-01-18

1996-07-30

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134105, 134902, 134111, 1341023, B08B 310

Patent

active

055402453

ABSTRACT:
A wafer processing equipment of a single wafer transfer type comprising a wafer cleaning apparatus, a pure water cooling system, a pure water circulatory system, and a wafer drying apparatus for drying the cleaned wafer one by one, is disclosed. The cleaning apparatus comprises a pure water jet device for cleaning a wafer by jetting pure water to which ultrasonic wave is applied, against the main surface of the wafer, and a pure water collection tank for collecting the used water. The cooling system comprises a heat exchanger provided in the collection tank, for cooling the pure water in the collection tank. The circulatory system is for circulating pure water stored in the collection tank, through a filter for catching pollution or particles contained in the stored pure water. The drying apparatus is for drying the cleaned wafer one by one.

REFERENCES:
patent: 4865060 (1989-09-01), Shibano
patent: 5045117 (1991-09-01), Witherell
patent: 5102504 (1992-04-01), Saito
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patent: 5314509 (1994-05-01), Kato et al.
patent: 5361787 (1994-11-01), Miyazaki et al.
patent: 5365960 (1994-11-01), Bran
patent: 5368054 (1994-11-01), Koretsky et al.
patent: 5383483 (1995-01-01), Shibano

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