Processing apparatus with means for rotating an object mounting

Details Processing apparatus with means for rotating an object mounting Processing apparatus with means for rotating an object mounting

1993-08-31

1996-05-28

Fourson, George

Coating apparatus

Gas or vapor deposition

Work support

C23C 1600

Patent

active

055207430

ABSTRACT:
There are provided a treatment chamber for removing natural oxide films formed on the surface and the underside of an object to be treated, e.g., a semiconductor wafer, in treating gas ambient atmosphere, holding member for holding the object to be treated in the treatment chamber, and a mounting member with, e.g., pins erected thereon, and a disk body disposed inside the mounting member. The mounting member and the disk body are rotated relatively to each other. The relative rotation of the mounting member and the disk body generates flows of the treating gas, so that the natural oxide films are homogeneously removed from the entire surface and underside of the object to be treated.

REFERENCES:
patent: 4468283 (1984-08-01), Ahmed
patent: 4749440 (1988-06-01), Blackwood et al.
patent: 4785962 (1988-11-01), Toshima
patent: 4788994 (1988-12-01), Shinbara
patent: 4825808 (1989-05-01), Takahashi et al.
patent: 5002011 (1991-03-01), Ohmine et al.
patent: 5135608 (1992-08-01), Okutani
patent: 5248380 (1993-09-01), Tanaka

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