Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-06-06
1997-04-29
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, 20429825, C23C 1434
Patent
active
056245360
ABSTRACT:
The sputtering system of the present invention includes a spare collimator storage chamber for accommodating one or more spare collimators and a processing chamber, which are provided in one-piece or in communication with each other through a gate valve. A used collimator in the processing chamber is quickly and readily replaced with a new collimator stored in the spare collimator storage chamber by a collimator exchanging device without exposing the interior of the processing chamber to atmospheric air.
REFERENCES:
patent: 5223001 (1993-06-01), Saeki
patent: 5223112 (1993-06-01), Tepman
patent: 5382339 (1995-01-01), Aranovich
Katsuki Jiro
Kobayashi Hiroshi
Wada Yuichi
Nguyen Nam
Tel Varian Limited
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