Plastic article or earthenware shaping or treating: apparatus – Control means responsive to or actuated by means sensing or... – Mold motion or position control
Reexamination Certificate
2006-06-07
2009-12-22
Gupta, Yogendra (Department: 1791)
Plastic article or earthenware shaping or treating: apparatus
Control means responsive to or actuated by means sensing or...
Mold motion or position control
C216S044000, C264S220000, C425S385000
Reexamination Certificate
active
07635260
ABSTRACT:
An imprint apparatus for forming an imprinted pattern on a member to be processed or a pattern forming material on the member to be processed by using a mold having a pattern. The apparatus includes a first holding portion for holding the mold, a second holding portion for holding the member to be processed, and a support portion for partially supporting the member to be processed at a position opposite to the mold held by the first holding portion. The second holding portion is movable in a direction of a first axis and a direction of a second axis and is also movable in a direction parallel to a plane defined by the first axis and the second axis so that the position at which the support portion supports the member to be processed is changed. The support portion is movable, independently of the first holding portion, perpendicularly to the plane so that the support portion is moved apart from the member to be processed, and the support portion is also movable perpendicularly to the plane so as to support the member to be processed.
REFERENCES:
patent: 3337664 (1967-08-01), Lyon
patent: 3945790 (1976-03-01), Puech
patent: 4584157 (1986-04-01), Sweig
patent: 5504627 (1996-04-01), Kim et al.
patent: 5772905 (1998-06-01), Chou
patent: 5951939 (1999-09-01), Chernyak et al.
patent: 6334960 (2002-01-01), Willson et al.
patent: 6387787 (2002-05-01), Mancini et al.
patent: 6517977 (2003-02-01), Resnick et al.
patent: 6580172 (2003-06-01), Mancini et al.
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6719915 (2004-04-01), Willson et al.
patent: 6818139 (2004-11-01), Lee et al.
patent: 6829988 (2004-12-01), George et al.
patent: 6940591 (2005-09-01), Sopp et al.
patent: 6943117 (2005-09-01), Jeong et al.
patent: 7060324 (2006-06-01), Bailey et al.
patent: 2003/0141017 (2003-07-01), Fujisato
patent: 2003/0170053 (2003-09-01), Montelius et al.
patent: 2004/0008344 (2004-01-01), Sopp et al.
patent: 2004/0170771 (2004-09-01), Bailey et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2005/0082698 (2005-04-01), Gutman et al.
patent: 2005/0186304 (2005-08-01), Seki
patent: 7-99197 (1995-04-01), None
patent: 2000-194142 (2000-07-01), None
patent: 2003-77867 (2003-03-01), None
patent: 2005-77867 (2005-03-01), None
patent: 2005-101313 (2005-04-01), None
patent: 10-2005-0077897 (2005-08-01), None
patent: WO 01/33300 (2001-05-01), None
patent: WO 01/42858 (2001-06-01), None
patent: WO 2004/044651 (2004-05-01), None
patent: WO 2004/099879 (2004-11-01), None
patent: WO 2005/119802 (2005-12-01), None
Hiroshima, Hiroshi. “SOFT (Sample On Flexible Thruster) Stage for Step-and-Repeat Nanoimprinter,” presented inThe Fourth International Conference on Nanoimprint and Nanoprint Technology Digest of Papers, Oct. 19-21, 200t, Nara, Japan (3 pages), 2005.
Chou, Stephen Y., et al. “Imprint of sub-25 nm vias and trenches in polymers,” Appl. Phys. Lett.., vol. 67, Issue 21, Nov. 20, 1995. pp. 3114-3116.
Colburn, M., et al., “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning,” Emerging Lithographic Technologies III—Proceedings of the SPIE's 24th International Symposium on Microlithography, Yuli Vladimirsky, Editor, Santa Clara, CA, vol. 3676, Part One, Mar. 15-17, 1999. pp. 379-389.
European Search Report dated Oct. 25, 2006, issued in corresponding European patent application No. EP 06 11 5095, forwarded in a Communication dated Nov. 13, 2006.
Hiroshima, Hiroshi. “Photo-nanoimprinting using SOFT (Sample On Flexible Thruster) Stage,” G.Y. Chen et al., Nano Lett., 4 (2004) 1225, presented Oct. 26-28, 2005, Microprocesses and Nanotechnology 2005, 2205 International Microprocesses and Nanotechnology Conference, Tokyo, Japan. pp. 256-257.
Communication pursuant to Article 94(3) EPC dated Jan. 29, 2008, issued in corresponding European patent application No. 06 115 095.9.
English translation of Chinese Office Action dated Feb. 29, 2008, issued in corresponding Chinese patent application No. 2006-10091718.1.
Notice of Allowance issued from the Korean Intellectual Property Office dated Nov. 13, 2007, issued in corresponding Korean patent application No. 10-2006-0050739.
Communication pursuant to Article 94(3) EPC, mailed in a Communication dated Oct. 10, 2008, in copending European patent application No. 06 115 095.9.
Taiwan IPO Search Report completed Feb. 20, 2009, mailed in a Taiwan Office Action dated Apr. 15, 2009, in copending Taiwan patent application No. 095120253, with their respective English translations.
Majima Masao
Seki Jun-ichi
Suehira Nobuhito
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Gupta Yogendra
Luk Emmanuel S
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