Processing apparatus for target processing substrate

Details Processing apparatus for target processing substrate Processing apparatus for target processing substrate

1997-08-26

1999-11-02

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134147, 134153, 134902, B08B 302

Patent

active

059750979

ABSTRACT:
A processing apparatus of this invention has an openable window portion for transferring a target processing substrate, and an inlet port for introducing the outer atmosphere. Further, the processing apparatus includes a closed processing chamber for performing predetermined processing for the target processing substrate transferred via the window portion, an exhaust means for evacuating the interior of the processing chamber, and an opening/closing mechanism for closing the inlet port, and opening the inlet port when the pressure in the processing chamber is negative.

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patent: 5722441 (1998-03-01), Treamoto
patent: 5778911 (1998-07-01), Yoshio

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