Material or article handling – Apparatus for charging a load holding or supporting element... – With simultaneous charging and discharging of plural load...
Patent
1994-03-15
1995-10-31
Bucci, David A.
Material or article handling
Apparatus for charging a load holding or supporting element...
With simultaneous charging and discharging of plural load...
414217, 414786, 414937, 414939, 414940, 118719, C23C 1600
Patent
active
054623979
ABSTRACT:
The processing apparatus of the present invention comprises a processing chamber for providing a predetermined processing to a processing object, a transfer chamber having transfer arm for transferring a holding member holding the processing object to/from the processing chamber, inactive gas supply and exhaust pipe for maintaining the inside of the transfer chamber to be in a predetermined inactive gas atmosphere, a holding member containing chamber, provided adjacent to the transfer chamber, having a capacity being capable of containing at least the holding member, and being capable of transferring the holding member to/from the transfer chamber in a state that an atmosphere of the transfer chamber is isolated from outside air, inside atmosphere substituting control for providing substitution so as to set the inside of the holding member containing chamber to be in a vacuum atmosphere or a predetermined inactive gas atmosphere, and an processing object transfer chamber, provided to be adjacent to the holding member containing chamber, having transfer arm for transferring the processing object to the holding member of the holding member containing chamber.
REFERENCES:
patent: 4643629 (1987-02-01), Takahashi et al.
patent: 4797054 (1989-01-01), Arii
patent: 4990047 (1991-02-01), Wagner et al.
patent: 5110248 (1992-05-01), Asano et al.
patent: 5181819 (1993-01-01), Sakata et al.
patent: 5221201 (1993-06-01), Yamaga et al.
patent: 5273423 (1993-12-01), Shiraiwa
patent: 5277579 (1994-01-01), Takanabe
patent: 5303671 (1994-04-01), Kondo et al.
Bucci David A.
Tokyo Electron Limited
Tokyo Electron Tohoku Limited
LandOfFree
Processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1768453