Processing apparatus

Details Processing apparatus Processing apparatus

1997-08-01

1999-11-30

Mayes, Curtis

Coating apparatus

Projection or spray type

Rotating turret work support

118 61, 134144, 134172, B05B 1302, B08B 300

Patent

active

059935529

ABSTRACT:
A processing apparatus comprises a resist coating machine for coating resist on the surface of a substrate, a resist removing machine for removing the unnecessary resist stuck to the peripheral portion of the substrate carried out of the resist coating machine, and a transport arm for transporting the substrate from the resist coating machine to the resist removing machine, wherein the resist removing machine comprises a substrate table on which the substrate brought in by the transport arm is placed, a nozzle for spraying a solvent on the peripheral portion to remove the unnecessary resist stuck to the peripheral portion of the substrate on the substrate table; a discharge machine for discharging the solvent used to dissolve and remove the unnecessary resist and the dissolved and removed resist, and an exhaust machine for exhausting the atmosphere under the substrate table downward.

REFERENCES:
patent: 5349978 (1994-09-01), Sago et al.
patent: 5608943 (1997-03-01), Konishi et al.
patent: 5718763 (1998-02-01), Tateyama et al.

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