Processes for the production of organometallic compounds

Details Processes for the production of organometallic compounds Processes for the production of organometallic compounds

2006-08-29

2006-08-29

Nazario-Gonzalez, Porfirio (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

C548S402000, C549S003000

Reexamination Certificate

active

07098339

ABSTRACT:
This invention relates to processes for the production of organometallic compounds represented by the formula H3Al:Lnwherein L is one or more Lewis bases capable of providing an unshared electron pair to the aluminum and n is 1 or 2, which comprise (a) forming a first solution of an alkali metal aluminum hydride and a Lewis base in an ethereal solvent, (b) adding to said first solution an aluminum halide in an ethereal solvent under reaction conditions sufficient to produce a second solution comprising said organometallic compound, and (c) separating said organometallic compound from said second solution. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.

REFERENCES:
patent: 6121443 (2000-09-01), Shin
patent: 6143357 (2000-11-01), Shin et al.
patent: 6399772 (2002-06-01), Shin et al.
patent: 6432820 (2002-08-01), Lee et al.
patent: 2002/0132469 (2002-09-01), Lee et al.
patent: 2002/0160602 (2002-10-01), Lee et al.
patent: 2000 323481 (2000-11-01), None
Marlett et al., “Dimethylethylamine-Alane and N-Methylpyrrolidine-Alane. A convenient Synthesis of Alane, a Useful Selective Reducing Agent in organic Synthesis”,J. Org. Chem. 1990, 55, 2968-2969.
Ruff et al., “The Amine Complexes of Aluminium Hydride.” I,J. Amer. Chem. Soc., 1960, 82, 2141.
Kovar et al., “Trihydrido(Trimethylamine)Aluminum and (Diethylamino)Hydridoaluminum Complexes”,Inorg. Synth., 1977, 17, 36.
Frigo et al., “Preparation and Properties of Alane Dimethylethylamine, a Liquid Precursor for MOCVD”,Chem. Mater., 1994, 6, 190.

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