Processes for the production of a controlled atmosphere for heat

Details Processes for the production of a controlled atmosphere for heat Processes for the production of a controlled atmosphere for heat

1991-10-15

1993-05-04

Roy, Upendra

Metal treatment

Process of modifying or maintaining internal physical...

Carburizing or nitriding using externally supplied carbon or...

148208, 148237, C21D 100

Patent

active

052078396

ABSTRACT:
Substantially all residual oxidizing gas in a treating atmosphere which is inert or reducing, is eliminated by injecting into the atmosphere a gaseous silicon hydride at a temperature between 50 and 1,600.degree. C. and in amount such that the ratio R of the content of hydride to the content of oxidizing gas to be eliminated is within the range of 1.5 to 20. The rapid action of the trace amounts of hydride injected enables one to control with precision heat treatment processes by maintaining the residual oxidizing gas contents below predetermined very low thresholds.

REFERENCES:
patent: 3224909 (1965-12-01), Sixtus et al.
patent: 4683125 (1987-07-01), Yusa
patent: 5069728 (1991-12-01), Rancon et al.

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