Processes for the chemical vapor deposition and solvent used for

Details Processes for the chemical vapor deposition and solvent used for Processes for the chemical vapor deposition and solvent used for

1997-04-18

1999-05-04

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

427252, 4272551, 4272553, 427229, C23C 1618

Patent

active

059002794

ABSTRACT:
The present invention offers processes for CVD (chemical vapor deposition) that enables one to use a new metallic organic compound as a raw material resource. The present invention involves the steps of: adding a metallic organic compound having a group capable of becoming free to a liquid of a compound having the same group as the group capable of becoming free of the metallic organic compound to prepare a solution; vaporizing the solution; decomposing the metallic organic compound; and depositing a metallic film on a substrate.

REFERENCES:
Peterson et al., J. Electrochem. Soc., vol. 142, No. 3, pp. 939-943, Mar. 1995.

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