Processes for monitoring the levels of oxygen and/or...

Details Processes for monitoring the levels of oxygen and/or... Processes for monitoring the levels of oxygen and/or...

2008-06-03

2008-06-03

Deo, Duy-Vu N (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S710000, C438S714000, C438S725000

Reexamination Certificate

active

07381651

ABSTRACT:
Processes for monitoring the levels of oxygen and/or nitrogen in a substantially oxygen and nitrogen-free plasma ashing process generally includes monitoring the plasma using optical emission. An effect produced by the low levels of oxygen and/or nitrogen species present on other species generally abundant in the plasma is monitored and correlated to amounts of oxygen and nitrogen present in the plasma. This so-called “effect detection” process monitors perturbations in the spectra specifically associated with species other than nitrogen and/or oxygen due to the presence of trace amounts of oxygen and/or nitrogen species and is used to quantitatively determine the amount of oxygen and/or nitrogen at a sensitivity on the order of 1 part per million and potentially 1 part per billion.

REFERENCES:
patent: 4776690 (1988-10-01), Quimby
patent: 5708957 (1998-01-01), Chuang et al.
patent: 6638875 (2003-10-01), Han et al.
patent: 6864109 (2005-03-01), Chang et al.
patent: 6951823 (2005-10-01), Waldfried et al.
patent: 2002/0140932 (2002-10-01), Satou et al.
patent: 2004/0235299 (2004-11-01), Srivastava et al.
patent: 2004/0238123 (2004-12-01), Becknell et al.
patent: 2005/0019964 (2005-01-01), Chang et al.

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