Processes depending on plasma generation using a helical resonat

Details Processes depending on plasma generation using a helical resonat Processes depending on plasma generation using a helical resonat

1988-12-28

1990-04-17

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437228, 437229, 437233, 437235, 156643, 1566591, 20419225, 20419232, 330 56, 315 3951, 315 3971, H01L 2100, H01L 2102, C23F 100, C23C 1500

Patent

active

049180312

ABSTRACT:
Anisotropic plasma etching is accomplished utilizing a helical resonator operated at relatively low gas pressure. The use of this combination yields an extremely high flux of ionic species with resulting rapid anisotropic etching. A helical resonator in conjunction with suitable precursors is also quite useful for plasma induced deposition.

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