Etching a substrate: processes – Pattern or design applied by transfer
Reexamination Certificate
2005-09-02
2008-09-02
Hendricks, Keith D. (Department: 1794)
Etching a substrate: processes
Pattern or design applied by transfer
C438S430000, C438S322000
Reexamination Certificate
active
07419611
ABSTRACT:
A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
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DiPietro Richard Anthony
Hart Mark Whitney
Houle Frances Anne
Ito Hiroshi
George Patricia A
Hendricks Keith D.
Schmeiser Olsen & Watts
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