Etching a substrate: processes – Etching to produce porous or perforated article
Reexamination Certificate
2007-06-18
2010-11-16
Culbert, Roberts (Department: 1716)
Etching a substrate: processes
Etching to produce porous or perforated article
C216S090000, C216S091000, C438S753000
Reexamination Certificate
active
07833428
ABSTRACT:
Processes and apparatuses for producing a porous material, such as nano-porous silicon (npSi) media suitable for storage and retrieval of elemental hydrogen. Processes of this invention generally entail applying a magnetic field to a substrate that contains charge carriers and is in contact with an etchant, and then etching the substrate with the etchant while relative movement occurs between the substrate and the magnetic field. During etching, the charge carriers move relative to the substrate and the magnetic field, and porosity forms at surfaces of the substrate contacting the etchant.
REFERENCES:
patent: 08335578 (1996-12-01), None
Christenson John C.
Schubert Peter J.
Culbert Roberts
Hartman Domenica N. S.
Hartman Gary M.
Hartman & Hartman P.C.
Packer Engineering Inc.
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