Process-variation tolerant diode, standard cells including...

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Bidirectional rectifier with control electrode

Reexamination Certificate

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C257S046000, C257S105000, C257S570000, C257S910000, C257SE29195

Reexamination Certificate

active

07932537

ABSTRACT:
Process variation-tolerant diodes and diode-connected thin film transistors (TFTs), printed or patterned structures (e.g., circuitry) containing such diodes and TFTs, methods of making the same, and applications of the same for identification tags and sensors are disclosed. A patterned structure comprising a complementary pair of diodes or diode-connected TFTs in series can stabilize the threshold voltage (Vt) of a diode manufactured using printing or laser writing techniques. The present invention advantageously utilizes the separation between the Vtof an NMOS TFT (Vtn) and the Vtof a PMOS TFT (Vtp) to establish and/or improve stability of a forward voltage drop across a printed or laser-written diode. Further applications of the present invention relate to reference voltage generators, voltage clamp circuits, methods of controlling voltages on related or differential signal transmission lines, and RFID and EAS tags and sensors.

REFERENCES:
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patent: 5469106 (1995-11-01), Dow
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patent: 2005/0008880 (2005-01-01), Kunze et al.
patent: 2005/0174845 (2005-08-01), Koyama et al.
patent: 59-201459 (1984-11-01), None
Kamuro Setsushi; “Complementary Metal Oxide Semiconductor Field Effect Transistor Integrated Circuit”; Patent Abstracts of Japan; Publication No. JP59201459 (A); Publication Date: Nov. 15, 1984; Japan Patent Office, Japan.
Korean Office Action with English Translation; Dated Sep. 25, 2009; Korean Patent Application No. 10-2006-0115817; 8 pgs. total; Korean Intellectual Property Office, Republic of Korea.

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