Process using radiation curable epoxy containing resist and resu

Details Process using radiation curable epoxy containing resist and resu Process using radiation curable epoxy containing resist and resu

1977-07-01

1978-12-19

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

156643, 156901, 96 362, 96115R, 96 86P, 20415913, G03C 171

Patent

active

041304241

ABSTRACT:
Negative resist compositions are based on carbonaceous polymers with substituent branches containing epoxy groupings. Exemplary materials which include, for example, a copolymer of glycidyl methacrylate and ethyl acrylate in which epoxy groupings are unesterified show high sensitivity, for example, to electron radiation and to X-rays. Resolution is sufficient to permit expedient fabrication of detailed resist patterns for integrated circuits. High adherence permits use of acid or base reagents and thermal stability permits use of ion milling for circuit fabrication.

REFERENCES:
patent: 3916035 (1975-10-01), Brewer
patent: 3931435 (1976-01-01), Gipstein et al.

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