Process useful in the fabrication of articles with metallized su

Details Process useful in the fabrication of articles with metallized su Process useful in the fabrication of articles with metallized su

1979-03-20

1980-07-29

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156643, 427 38, C23C 1500

Patent

active

042149665

ABSTRACT:
A method has been devised for metallizing a desired area on a substrate during the manufacture of semiconductor devices. This process includes the steps of depositing a material such as a polymer resist on the substrate to delineate the area to be metallized. Then a suitable metal is deposited onto the coated substrate leaving a metallic film on both the exposed area of the substrate and on the delineating material. This metallic film is then substantially removed only from the delineating material by a technique which includes ion milling at an acute angle to the plane of the substrate. Conventional techniques are then employed to remove the delineating material.

REFERENCES:
patent: 3860783 (1975-01-01), Schmidt et al.
patent: 4004341 (1977-01-01), Tung
patent: 4016062 (1977-04-01), Mehta et al.
patent: 4093503 (1978-06-01), Harris et al.
Sumio Hosaka et al., Influence of Sample Inclination and Rotation During Ion-Beam Etching, J. Vac. Sci. Technol., vol. 15, No. 5, Sep./Oct., 1978, pp. 1712-1717.

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