Process tolerance calculating method relating exposure amount an

Details Process tolerance calculating method relating exposure amount an Process tolerance calculating method relating exposure amount an

1998-01-06

1999-05-25

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

G03C 500

Patent

active

059069031

ABSTRACT:
A process tolerance calculating method which, in order to obtain a process tolerance in a process for forming a pattern on an object, to be processed, with the use of a projection light exposure apparatus, calculates a process tolerance for finding a relation of a light exposure amount and focal point position corresponding to a finished pattern of an allowable dimension value, comprising the steps of:

REFERENCES:
patent: 5756242 (1998-05-01), Koizumi et al.
B.J. Lin, "Partially Coherent Imaging in Two Dimensions and the Theoretical Limits of Projection Printing in Microfabrication", IEEE Tran. Electron Devices, vol. ED-27, No. 5, pp. 931-938, 1980.

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