Process to reduce the dark current in semiconducting films

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S024000, C438S048000, C438S056000, C257S414000, C257S431000

Reexamination Certificate

active

07151006

ABSTRACT:
A method of coating the joined crystals within a semiconductor conversion layer to reduce the dark current without compromising the sensitivity of the conversion layer is presented. A semiconductor conversion layer comprising a plurality of joined crystals and permeated by a polymer material and having microscopic voids is also presented.

REFERENCES:
patent: 5563421 (1996-10-01), Lee et al.
patent: 5648660 (1997-07-01), Lee et al.
patent: 5652430 (1997-07-01), Lee
patent: 5892227 (1999-04-01), Schieber et al.
patent: 6326625 (2001-12-01), Zur
patent: 6559449 (2003-05-01), Ikeda et al.
patent: 2003/0010923 (2003-01-01), Zur
patent: 2005/0079659 (2005-04-01), Duan et al.
patent: 2005/0148179 (2005-07-01), Hirai et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process to reduce the dark current in semiconducting films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process to reduce the dark current in semiconducting films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process to reduce the dark current in semiconducting films will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3653581

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.