Process to permit improvement of functional properties of polyol

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427331, 4274071, B05D 306, B05D 300

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active

050099248

ABSTRACT:
A process is described for modifying the surface of polymers such as polyolefins and the like to improve the wetability by barrier and other coatings and to enhance interlayer adhesion by graft polymerization through initiation by electron-beam radiation, optionally with an added electron energy acceptor.

REFERENCES:
patent: 2140048 (1938-12-01), Fikentscher et al.
patent: 2160054 (1939-05-01), Bauer et al.
patent: 3663261 (1972-05-01), Miettinen et al.
patent: 3719539 (1973-03-01), Lamb et al.
patent: 3909379 (1975-09-01), Gotoda et al.
patent: 4024040 (1977-05-01), Phalangas et al.
patent: 4066524 (1978-01-01), Phalangas
patent: 4115339 (1978-09-01), Restaino
patent: 4761316 (1988-08-01), Ogawa
patent: 4822828 (1989-04-01), Swofford
patent: 4891241 (1990-01-01), Hashimoto et al.
"Handbook of Adhesives," Second Edition, edited by Irving Skeist (1977), pp. 56, 62, 640-652, 655 and 841.
"Silane Coupling Agents," E. Plueddeman (1982), pp. 1-4, 111-138, 162-163 and 167-204.
"The Chemistry of Acrylonitrile," Second Edition, American Cyanamid Company (1959), pp. 29-31.

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