Solid anti-friction devices – materials therefor – lubricant or se – Lubricants or separants for moving solid surfaces and...
Reexamination Certificate
2011-08-09
2011-08-09
Griffin, Walter (Department: 1774)
Solid anti-friction devices, materials therefor, lubricant or se
Lubricants or separants for moving solid surfaces and...
C208S018000, C208S019000
Reexamination Certificate
active
07994104
ABSTRACT:
A process to make a light base oil fraction having a wt % Noack volatility between 0 and 100 and additionally less than a Noack Volatility Factor (NVF), wherein the Noack Volatility Factor is defined by the equation: 900×(Kinematic Viscosity at 100° C.)−2.8−15. The process comprises hydroisomerization dewaxing a waxy feed in a series of two or more reactors, and recovering the light base oil fraction having a low wt % Noack volatility.
REFERENCES:
patent: 6652735 (2003-11-01), Degnan et al.
patent: 7083713 (2006-08-01), Abernathy et al.
patent: 2004/0094453 (2004-05-01), Lok et al.
patent: 2005/0133407 (2005-06-01), Abernathy et al.
patent: 2005/0133409 (2005-06-01), Abernathy et al.
patent: 2005/0261146 (2005-11-01), Rosenbaum et al.
patent: 2005/0261147 (2005-11-01), Rosenbaum et al.
patent: 2006/0201851 (2006-09-01), Rosenbaum et al.
patent: 2006/0201852 (2006-09-01), Rosenbaum et al.
patent: 2006/0205610 (2006-09-01), Rosenbaum et al.
patent: 1238045 (2001-05-01), None
patent: WO2004/053034 (2004-06-01), None
Bertrand Nancy J.
Deskin Scott C.
Lok Brent K.
Miller Stephen J.
Rosenbaum John M.
Abernathy Susan M.
Campanell Francis C
Chevron U.S.A. Inc.
Gess E. Joseph
Griffin Walter
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