Process to continuously determine the profile of a charge fed in

Specialized metallurgical processes – compositions for use therei – Processes – Electrothermic processes

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

266 99, 356376, 358101, 358107, 358100, C21B 724

Patent

active

043157718

ABSTRACT:
A process to continuously determine by an optical arrangement the profile of a charge fed into a blast furnace in which the surface of the charge is swept by a beam of light moving in a plane intersecting the surface so as to produce at the intersection of the plane with the surface a luminous trace, observing the luminous trace from a point outside the sweeping plane, and determining on the basis of the data defining the sweeping plane, the observation point and the direction of observation with respect to the plane the true position of the points constituting the luminous trace; and an apparatus for carrying out the process and including an illuminating system for illuminating the surface of the charge with a beam of light sweeping in a plane intersecting the surface to produce on the surface a luminous trace and a reception system cooperating with the illumination system for producing a picture of the actual profile of the luminous trace.

REFERENCES:
patent: 3364012 (1968-01-01), Noel
patent: 3544710 (1970-12-01), Poos
patent: 3588067 (1971-06-01), Shimotsuma et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process to continuously determine the profile of a charge fed in does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process to continuously determine the profile of a charge fed in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process to continuously determine the profile of a charge fed in will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-941510

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.