Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2006-10-31
2006-10-31
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000
Reexamination Certificate
active
07129199
ABSTRACT:
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of pattern collapse defects on a plurality of photoresist coated substrates employing the process solution of the present invention.
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Barber Leslie Cox
Curzi Danielle Megan King
Karwacki, Jr. Eugene Joseph
Zhang Peng
Air Products and Chemicals Inc.
Morris-Oskanian Rosaleen P.
Rossi Joseph D.
Webb Gregory
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