Process solution supplying apparatus

Details Process solution supplying apparatus Process solution supplying apparatus

1998-06-26

2000-12-26

Sells, James

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

118313, 118320, B05C 1100

Patent

active

061652709

ABSTRACT:
A process solution supplying mechanism for supplying a process solution to a wafer, comprises a source for containing the process solution, a pipe for introducing the process solution from the source to the wafer, a process solution supply driving system for supplying the process solution from the source to the wafer, and a process solution supplying/stopping mechanism for carrying out apply and stop of the process solution, wherein the pipe and the process solution supply driving system are provided separately and the process solution supplying/stopping mechanism is provided to a portion other than the pipe.

REFERENCES:
patent: 5665200 (1997-09-01), Fujimoto et al.

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