Chemistry: electrical and wave energy – Processes and products
Patent
1989-01-06
1992-01-28
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
204 78, C25B 302
Patent
active
050841475
ABSTRACT:
A process of oxidation or reduction of organic substrates by an indirect electrochemical route is described. During oxidation, the electrochemical stage produces a metallic oxide having higher valence such as RuO.sub.2, NiOOH, which is applied to an inert conductor support. The supported metallic oxide of higher valence is separated from the aqueous electrolyte and is then placed in contact with the pure organic material to be reacted on. The metallic oxide in this manner is reduced to a lower valence and is subjected to a new electrochemical oxidation after the residues of the organic material are removed. The process consists of a cyclic repetition of these stages. The process of reduction of organic substrates is analogous and is carried out by means of the hydrogen of hydrides formed through a cathodic charge by electrolysis of an aqueous solution.
REFERENCES:
patent: 3953305 (1976-04-01), Connolly
patent: 4411746 (1983-10-01), Degner et al.
patent: 4488944 (1984-12-01), Stutts et al.
patent: 4496440 (1985-01-01), Campbell et al.
patent: 4596638 (1986-06-01), Trocciola et al.
patent: 4640750 (1987-02-01), Blickle
patent: 4692227 (1987-09-01), Spotnitz et al.
patent: 4701245 (1987-10-01), Kreh
Bianchi Giuseppe
Burei Giovanni
Valsecchi Franco
Bianchi Giuseppe
Enichem Synthesis S.p.A.
Marquis Steven P.
Niebling John F.
Valsecchi Franco
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