Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-06-13
1999-08-17
Warden, Jill
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 26, 134 30, 134 38, 134 40, B08B 700
Patent
active
059388560
ABSTRACT:
This invention relates to the use of non-halogenated and non-aromatic cleaning solvents as environmentally safe replacement of perchloroethylene and xylene to remove rosin flux residue formed on electronic circuit device materials during solder interconnection process for assembly of electronic components.
REFERENCES:
patent: 3401126 (1968-09-01), Miller et al.
patent: 3429040 (1969-02-01), Miller et al.
patent: 4276186 (1981-06-01), Bakos et al.
patent: 4438190 (1984-03-01), Ishimaru et al.
patent: 5112517 (1992-05-01), Buchwald et al.
patent: 5114609 (1992-05-01), Buchwald et al.
patent: 5116426 (1992-05-01), Asano et al.
patent: 5188754 (1993-02-01), Weltman et al.
patent: 5246618 (1993-09-01), Buchwald et al.
patent: 5302313 (1994-04-01), Asano et al.
patent: 5308402 (1994-05-01), Bixenman et al.
patent: 5330582 (1994-07-01), Chihara et al.
patent: 5340407 (1994-08-01), Bolden et al.
patent: 5395548 (1995-03-01), Phahl, Jr. et al.
patent: 5401325 (1995-03-01), Mihelic et al.
patent: 5414144 (1995-05-01), Watanabe et al.
patent: 5431739 (1995-07-01), Bengston
patent: 5454970 (1995-10-01), Flaningman et al.
patent: 5482563 (1996-01-01), Pfahl Jr. et al.
patent: 5482645 (1996-01-01), Maruyama et al.
patent: 5574002 (1996-11-01), Shiino et al.
patent: 5612303 (1997-03-01), Takayanagi et al.
patent: 5628833 (1997-05-01), McCormack et al.
patent: 5643818 (1997-07-01), Sachdev et al.
Ahmad Umar M.
Knickerbocker John U.
Lei Chon C.
Sachdev Krishna G.
Ahsan Aziz M.
International Business Machines - Corporation
Markoff Alexander
Tomaszewski John J.
Warden Jill
LandOfFree
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