Process of reducing trace levels of metal impurities from resist

Details Process of reducing trace levels of metal impurities from resist Process of reducing trace levels of metal impurities from resist

1995-07-17

1997-04-08

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Combined

430169, 528482, 528490, 528491, 528495, 528497, 528499, C08F 600

Patent

active

056186550

ABSTRACT:
A process of removing trace metal impurities from an impure resist component solution comprising the steps of:

REFERENCES:
patent: 2865875 (1958-12-01), Hyman et al.
patent: 3067172 (1962-12-01), Carlstrom
patent: 3432453 (1969-03-01), Gladney et al.
patent: 4033909 (1977-07-01), Papa
patent: 4725523 (1988-02-01), Miura et al.
patent: 5073622 (1991-12-01), Wojtech et al.
patent: 5075193 (1991-12-01), Dresely et al.
patent: 5080997 (1992-01-01), Hioki et al.
patent: 5116715 (1992-05-01), Roland et al.
patent: 5378802 (1995-01-01), Honda

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