Metal working – Barrier layer or semiconductor device making
Patent
1994-04-28
1996-10-15
Niebling, John
Metal working
Barrier layer or semiconductor device making
437212, 437925, H01L 2158, H01L 2168
Patent
active
055650082
ABSTRACT:
A method of manufacturing semiconductor devices includes accommodating the semiconductor devices in the form of semimanufactures in accomodating tools having uniform outer dimensions regardless of the type of the semiconductor devices; receiving the semiconductor devices in the form of semimanufactures in each of a plurality of processing devices while maintaining the semiconductor devices in the accomodating tools; and processing the semiconductor devices in the form of semimanufactures in each of a plurality of processing devices.
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Imanaka Kiyoji
Kobayashi Kunio
Shigetomo Kunihiro
Takamura Jiro
Graybill David E.
Mitsubishi Denki & Kabushiki Kaisha
Niebling John
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