Process of producing multicrystalline silicon substrate and...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Havin growth from molten state

Reexamination Certificate

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C117S083000

Reexamination Certificate

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10505979

ABSTRACT:
There is provided a process of producing a multicrystalline silicon substrate having excellent characteristics as a solar cell substrate. A multicrystalline silicon ingot made by directional solidification10is cut such that a normal line of a principal surface14of a multicrystalline silicon substrate13is substantially perpendicular to a longitudinal direction of crystal grains11of the multicrystalline silicon ingot made by directional solidification10.

REFERENCES:
patent: 6013872 (2000-01-01), Woditsch et al.
patent: 6387780 (2002-05-01), Nishida
patent: 2002/0009895 (2002-01-01), Nishida
patent: 07-215714 (1995-08-01), None
patent: 10/98205 (1998-04-01), None
patent: 11-92284 (1999-04-01), None
patent: 11-116386 (1999-04-01), None
patent: 11-288881 (1999-10-01), None
patent: 2000/1308 (2000-01-01), None
patent: 2000-114556 (2000-04-01), None
patent: 2001-19593 (2001-01-01), None
Derwent WPI, WPI Acc. No. 1988-232193/198833, abstract of JP 63-166711, Jul. 1988.

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