Process of producing exposure mask

Details Process of producing exposure mask Process of producing exposure mask

1990-06-11

1993-04-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430 30, 430296, 430494, 430942, 378 35, 2504922, 2504923, G03F 900

Patent

active

052022048

ABSTRACT:
A process of producing an exposure mask by which the accuracy of a pattern of a mask film to be formed on a surface of a transparent substrate is improved and also the accuracy in registration between layers is improved. The process comprises the step of correcting, upon exposure for the formation of a mask pattern, the position of a mask pattern by a different correction amount in accordance with a ratio at which the area of the mask film which remains after etching occupies in the entire area of a transparent substrate on which the mask film is formed.

REFERENCES:
patent: 4377627 (1983-03-01), Vinton
patent: 4621371 (1986-11-01), Gotou et al.
patent: 4887283 (1989-12-01), Hosono
patent: 5083032 (1992-01-01), Suzuki

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