Process of preparing silicon tetrafluoride by using hydrogen flu

Details Process of preparing silicon tetrafluoride by using hydrogen flu Process of preparing silicon tetrafluoride by using hydrogen flu

1981-07-01

1983-05-03

Cooper, Jack

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

C01B 3308

Patent

active

043820719

ABSTRACT:
A process of preparing silicon tetrafluoride by introducing hydrogen fluoride gas into a dispersion of powdery silicon oxide material, which needs not to be pure SiO.sub.2, in sulfuric acid not lower than 65% in the concentration of H.sub.2 SO.sub.4. The reaction takes place even at room temperature. By using amorphous silicon oxide material, the rate of reaction can be enhanced with better yield. Preferably, the concentration of H.sub.2 SO.sub.4 in the liquid phase of the reaction system is maintained above 80% to obtain SiF.sub.4 containing little (SiF.sub.3).sub.2 O.

REFERENCES:
patent: 2833628 (1958-05-01), Molstad
patent: 2861872 (1958-11-01), Heller et al.
patent: 3645678 (1972-02-01), Parish et al.
patent: 3674431 (1972-07-01), Driscoll et al.
patent: 4206189 (1980-06-01), Kosintsev et al.

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