Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
Patent
1993-07-08
1999-04-20
Chen, Vivian
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Resist material applied in particulate form or spray
216 22, 216 41, 216 49, 216 50, 216 97, B44C 122, C03C 1500
Patent
active
058955828
ABSTRACT:
The present invention relates to a glass substrate for a thin film magnetic data storage disk and to a process for producing such a glass substrate. The process includes the steps of: (a) providing a glass substrate; (b) printing a regular masking pattern of printed dots onto at least a portion of the surface of the substrate; and (c) etching the unmasked surface of the substrate thereby to texture the substrate surface. The glass substrate for a thin film magnetic data storage disk has a roughened surface produced by preferential area etching, the roughened surface being composed of a regular pattern of peaks separated by valleys.
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Marshall Paul Andrew
Wilson Christopher John
Chen Vivian
Pilkington plc
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