Process of making silicon dioxide films for use as wear resistan

Details Process of making silicon dioxide films for use as wear resistan Process of making silicon dioxide films for use as wear resistan

1979-08-30

1981-05-19

Pianalto, Bernard D.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

427130, 427131, 427132, C23C 1500

Patent

active

042683696

ABSTRACT:
A magnetic recording medium of improved durability is obtained by depositing a coating of silicon dioxide over a magnetic metallic film.

REFERENCES:
patent: 3164493 (1965-01-01), Lindberg
patent: 3345218 (1967-10-01), Brookover et al.
patent: 3767369 (1973-10-01), Barlow
patent: 4154875 (1979-05-01), Yanagisawa et al.
IBM Tech. Dis. Bull., vol. 16, No. 12, 5-74 Heller, p. 3962.

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