Process of making Schottky barrier devices formed by diffusion b

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29571, 29591, 357 15, H01L 21225

Patent

active

046327134

ABSTRACT:
Increased barrier heights at metal(36)-semiconductor(32) contacts for semiconductors such as gallium arsenide by formation of an opposite doping type thin layer (34) on the semiconductor (32) surface by surface diffusion of dopants are disclosed. Preferred embodiments diffuse zinc 50 to 400 .ANG. into n type gallium arsenide (32) by rapid thermal pulses; then aluminum or titanium-platinum (36) contacts to the zinc doped layer (34) are deposited by evaporation and lift off.

REFERENCES:
patent: 3820235 (1974-06-01), Goldman
patent: 3907617 (1975-09-01), Zwernemann
patent: 3938243 (1976-02-01), Rosvold
patent: 4186410 (1980-01-01), Cho et al.
patent: 4265934 (1981-05-01), Ladd
patent: 4332076 (1982-01-01), de Zaldivar
patent: 4389768 (1983-06-01), Fowler et al.
patent: 4414737 (1983-11-01), Menjo et al.
patent: 4434013 (1984-02-01), Bol
patent: 4485550 (1984-12-01), Koeneke
patent: 4545824 (1985-10-01), Salvi et al.
patent: 4569119 (1986-02-01), Terada et al.
patent: 4586968 (1986-05-01), Coello-Vera

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process of making Schottky barrier devices formed by diffusion b does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of making Schottky barrier devices formed by diffusion b, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of making Schottky barrier devices formed by diffusion b will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1545476

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.