Process of making platinum silicide fuse links for integrated ci

Details Process of making platinum silicide fuse links for integrated ci Process of making platinum silicide fuse links for integrated ci

1977-06-20

1979-01-23

Gilden, Leon

Metal working

Method of mechanical manufacture

Electrical device making

29578, 357 51, H01H 6902

Patent

active

041352955

ABSTRACT:
Selected circuit elements and interconnections of an integrated circuit device are connected by platinum silicide fuse links which open when electrical power exceeds a threshold amount. The fuse is constructed by defining the fuse geometry in a polycrystalline silicon layer over a wafer substrate, depositing a layer of platinum thereover and then sintering the platinum into the polysilicon.

REFERENCES:
patent: 3287612 (1966-11-01), Lepselter
patent: 3335338 (1967-08-01), Lepselter
patent: 3590471 (1971-07-01), Lepselter
patent: 3783506 (1974-01-01), Pelfield
patent: 3792319 (1974-02-01), Tsang

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