Process of making diazoquinone sensitized polyamic acid based ph

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430192, 430193, 430325, 430326, 430330, 430270, G03F 7023, G03C 160

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active

049421085

ABSTRACT:
The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.

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