Process of making and using micro mask

Details Process of making and using micro mask Process of making and using micro mask

1992-06-02

1993-10-19

Fourson, George

Fishing, trapping, and vermin destroying

437233, 437235, 437238, 437977, 437919, 437 52, H01L 21308

Patent

active

052545032

ABSTRACT:
A method is provided to enable the formation of sub-lithographic relief images to increase the surface area of semiconductor structures for use in the storage nodes of DRAM cells. The method includes the steps of forming in situ a non-planar region having a relief pattern comprising sub-micron sized elements and the transferring the relief pattern into a masking layer in order to selectively etch a substrate to form relatively deep trenches having a density equal to the relief pattern. Polysilicon and porous silicon can be used to form the sub-micron relief pattern.

Affiliated with

Also associated with

Rating

Process of making and using micro mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of making and using micro mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of making and using micro mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1351412