Process of making and using fade-resistant diazo microfilm

Details Process of making and using fade-resistant diazo microfilm Process of making and using fade-resistant diazo microfilm

1980-02-04

1981-12-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Micrography, process, composition, or product other than...

430146, 430150, 430157, 430158, 430162, 430168, 430171, G03C 518

Patent

active

043060072

ABSTRACT:
A diazo microfilm which is resistant to fading upon exposure to strong light for extended periods of time is provided. The fade-resistant diazo microfilm is produced by saponifying a cellulose alkanoate film to an extent defined by certain infrared absorption parameters.

REFERENCES:
patent: 2276151 (1942-03-01), Brandenberger
patent: 3311475 (1967-03-01), Van Loon et al.
patent: 3338713 (1967-08-01), Hendrickx et al.
patent: 3365293 (1968-01-01), Haefeli et al.
patent: 3498791 (1970-03-01), Rauhut et al.
patent: 3619191 (1971-11-01), Desjavlais
Barba, A., et al., SPSE Symposium on Unconventional Photographic Systems, 10/1964, Paper No. 28, p. 143.
Habib, D., SPSE Symposium on Unconventional Photographic Systems, 2nd Symp., 10/1967, pp. 6-10.
Dinaburg, M.S., "Photosensitive Diazo Cpds and Their Uses", Focal Press, 1964, pp. 140-158.

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