Process of forming photoresist layer on a glass substrate

Details Process of forming photoresist layer on a glass substrate Process of forming photoresist layer on a glass substrate

1978-12-18

1981-03-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

Using specified radiation-sensitive composition other than a...

430 23, 430167, 430196, 430272, G03C 174, G03C 192, G03C 171

Patent

active

042541972

ABSTRACT:
When a low molecular weight dihydric or trihydric alcohol is added to a photoresist composition comprising a water-soluble polymer substance and a bisazide photo-crosslinking agent, the fluidity of the composition is improved and the drying speed is moderately retarded and it enables the formation of a photoresist layer having a uniform film thickness and uniform drying degree. The said alcohol is exemplified by ethylene glycol, glycerol, etc. and is preferably added in an amount of 5-300 parts by weight per 100 parts by weight of the water-soluble polymer substance.

REFERENCES:
Grant, J., "Hackh's Chemical Dictioanry," 4th Ed., 1969, p. 302 relied on.

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