Process of forming pattern and exposure apparatus

Details Process of forming pattern and exposure apparatus Process of forming pattern and exposure apparatus

1996-08-13

1999-11-09

Epps, Georgia

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 47, G03B 2754, G03B 2742, G03B 2758

Patent

active

059824760

ABSTRACT:
A process of forming a pattern on a substrate by irradiating light for exposure from a light source to a mask to transfer the pattern of this mask onto the substrate, wherein, before forming the intended final pattern on the substrate, exposure is carried out with an inspection pattern to a diagnostic region in which the final pattern is not to be formed, the distribution of the intensity of light irradiated to the diagnostic region is found, and at least the secondary peak of this distribution of the light intensity is observed, whereby the light source conditions are optimized and the optimized condition light source is used for forming the pattern.

REFERENCES:
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patent: 5162867 (1992-11-01), Kohno
patent: 5338630 (1994-08-01), Yoon et al.
patent: 5367358 (1994-11-01), Kamon
patent: 5477058 (1995-12-01), Sato
patent: 5617181 (1997-04-01), Yanagihara et al.
patent: 5627625 (1997-05-01), Ogawa
patent: 5677757 (1997-10-01), Taniguchi et al.
patent: 5710620 (1998-01-01), Taniguchi
patent: 5792592 (1998-08-01), Uchida et al.
patent: 5829868 (1998-11-01), Hutton

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