Process of forming a pattern on a substrate

Details Process of forming a pattern on a substrate Process of forming a pattern on a substrate

2005-05-10

2005-05-10

Tarazano, D. Lawrence (Department: 1773)

Stock material or miscellaneous articles

Composite

Of metal

C428S325000, C428S332000, C428S195100, C428S208000, C428S210000, C428S914000, C428S432000, C428S442000

Reexamination Certificate

active

06890663

ABSTRACT:
A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.

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