Process of film resistor laser trimming and composition of remov

Details Process of film resistor laser trimming and composition of remov Process of film resistor laser trimming and composition of remov

1977-10-27

1979-03-27

Van Balen, William J.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

252500, 428447, 427 53, 427101, 260375B, B32B 1900

Patent

active

041466730

ABSTRACT:
A process of film resistor laser trimming. The process involves coating a resistor prior to trimming with a removable insulative material which absorbs and traps trimming debris, thus minimizing or preventing deposition of same on the trimmed resistor surface. Formation of conductive paths otherwise created over the surface of the resistor by the trimming debris is precluded thereby, thus enabling greater accuracy with respect to trimmed resistor measurement. The coating used is a composition of phenyl polysiloxane with silica dispersed therein.

REFERENCES:
patent: 3626143 (1971-12-01), Fry
patent: 3915924 (1975-10-01), Wright
patent: 4027053 (1977-05-01), Lesk
patent: 4059461 (1977-11-01), Fan et al.

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