Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2006-04-18
2006-04-18
Ackun, Jr., Jacob K. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C029S603150, C029S603160, C360S122000
Reexamination Certificate
active
07029376
ABSTRACT:
In the formation of the top magnetic write pole in a thin film magnetic recording head, a CMP stop layer comprising rhodium is deposited over the Al2O3layer that overlies the top magnetic pole. A mixture of silicon dioxide, ammonium persulfate and benzotriazole is employed as a slurry in the CMP process that removes the portion of the Al2O3layer covering the top magnetic pole. This eliminates the need for an extra thick layer of Al2O3to be first deposited over the top pole and then removed to expose the top pole. The magnetic layer that forms the top pole can be plated to the target thickness of the top pole. As a result, the thickness of the photoresist layer that is used to define the size and shape of the top pole can be decreased to a desirable thickness, facilitating the use of DUV radiation to expose the photoresist layer.
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Guthrie Hung-Chin
Jiang Ming
Lo Jyh-Shuey
Zhang Hong
Ackun Jr. Jacob K.
Hitachi Global Storage Technologies - Netherlands B.V.
Silicon Valley Patent & Group LLP
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