Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2005-02-08
2005-02-08
Smith, Matthew (Department: 2825)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S031000, C438S692000, C438S221000, C438S689000, C438S548000, C430S321000, C430S322000, C430S323000, C385S002000, C385S122000, C385S129000, C385S008000, C385S014000
Reexamination Certificate
active
06852563
ABSTRACT:
A process for fabricating an electro-optic device is decribed that includes: a) providing a substrate comprising at least two polymer micro-ridges, where each polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; c) etching a predetermined amount of the deposited metal thin film on the lower surface, thereby forming two electrodes separated by a gap; d) depositing a nonlinear optical polymer in the gap between the two electrodes; and e) poling the nonlinear optical polymer to induce electro-optic activity.
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Dinu Raluca
Jin Dan L.
Kressbach Jeffrey K.
Anya Igwe U.
Fish & Richardson P.C. P.A.
Lumera Corporation
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