Process of fabricating electro-optic polymer devices with...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S031000, C438S692000, C438S221000, C438S689000, C438S548000, C430S321000, C430S322000, C430S323000, C385S002000, C385S122000, C385S129000, C385S008000, C385S014000

Reexamination Certificate

active

06852563

ABSTRACT:
A process for fabricating an electro-optic device is decribed that includes: a) providing a substrate comprising at least two polymer micro-ridges, where each polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; c) etching a predetermined amount of the deposited metal thin film on the lower surface, thereby forming two electrodes separated by a gap; d) depositing a nonlinear optical polymer in the gap between the two electrodes; and e) poling the nonlinear optical polymer to induce electro-optic activity.

REFERENCES:
patent: 5120339 (1992-06-01), Markovich et al.
patent: 5143577 (1992-09-01), Haas et al.
patent: 5198513 (1993-03-01), Clement et al.
patent: 5219788 (1993-06-01), Abernathey et al.
patent: 5223356 (1993-06-01), Kumar et al.
patent: 5370969 (1994-12-01), Vidusek
patent: 5433895 (1995-07-01), Jeng et al.
patent: 5480687 (1996-01-01), Heming et al.
patent: 5497445 (1996-03-01), Imoto
patent: 5635576 (1997-06-01), Foll et al.
patent: 5714304 (1998-02-01), Gibbons et al.
patent: 5729641 (1998-03-01), Chandonnet et al.
patent: 5776374 (1998-07-01), Newsham et al.
patent: 5783319 (1998-07-01), Reisfeld et al.
patent: 5811507 (1998-09-01), Chan et al.
patent: 5861976 (1999-01-01), Hoekstra
patent: 5887116 (1999-03-01), Grote
patent: 6002828 (1999-12-01), Hult et al.
patent: 6019906 (2000-02-01), Jang et al.
patent: 6031945 (2000-02-01), You et al.
patent: 6060170 (2000-05-01), Burgoyne, Jr.
patent: 6117967 (2000-09-01), Fuller et al.
patent: 6126867 (2000-10-01), Kanitz et al.
patent: 6229949 (2001-05-01), Ido et al.
patent: 6294573 (2001-09-01), Curtin et al.
patent: 6303730 (2001-10-01), Fries et al.
patent: 6306563 (2001-10-01), Xu et al.
patent: 6323361 (2001-11-01), Wu et al.
patent: 6335149 (2002-01-01), Xu et al.
patent: 6419989 (2002-07-01), Betz et al.
patent: 6449417 (2002-09-01), Binkley et al.
patent: 6466707 (2002-10-01), Dawes et al.
patent: 6473551 (2002-10-01), Norwood et al.
patent: 6632741 (2003-10-01), Clevenger et al.
patent: 20040067449 (2004-04-01), Dinu et al.
patent: 961139 (1999-01-01), None
patent: 04238305 (1992-08-01), None
patent: 09258151 (1997-10-01), None
patent: 10049443 (1998-02-01), None
patent: 10232323 (1998-09-01), None
patent: 2001255426 (2001-09-01), None
U.S. Appl. No. 10/264,461, filed Oct. 3, 2002, Dinu et al.
U.S. Appl. No. 10/301,978, filed Nov. 22, 2002, Huang et al.
Bailey et al., “Step and flash imprint lithography: Template surface treatment and defect analysis,”J. Vac. Sci. Technol. B, 2000, 18(6):3572-3577.
Chen et al., “Thermosetting Polyurethanes with Stable and Large Second-Order Optical Nonlinearity,”Macromolecules, 1992, 25:4032-4035.
Grote et al., “Effect of conductivity and dielectric constant on the modulation voltage for optoelectronic devices based on nonlinear optical polymers,”Opt. Eng., 2001, 40(11):2464-2473.
Ma et al., “A Novel Class of High-Performance Perfluorocyclobutane-Containing Polymers for Second-Order Nonlinear Optics,”Chem. Mater., 2000, 12:1187-1189.
Ma et al., “Highly Efficient and Thermally Stable Nonlinear Optical Dendrimer for Electrooptics,”J. Am. Chem. Soc., 2001, 123:986-987.
Mao et al., “Progress toward Device-Quality Second-Order Nonlinear Optical Materials. 1. Influence of Composition and Processing Conditions on Nonlinearity, Temporal Stability, and Optical Loss,”Chem. Mater., 1998, 10:146-155.
Oh et al., “Electro-optic polymer modulators for 1.55 μm wavelength using phenyltetraene bridged chromophore in polycarbonate,”Appl. Phys. Lett., 2000, 76(24):3525-3527.
Resnick et al., “Release Layers for Contact and Imprint Lithography,”Semicon. Int., Jun. 2002, online version, 7 pgs.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process of fabricating electro-optic polymer devices with... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of fabricating electro-optic polymer devices with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of fabricating electro-optic polymer devices with... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3462353

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.