Process of fabricating a semiconductor device involving densific

Details Process of fabricating a semiconductor device involving densific Process of fabricating a semiconductor device involving densific

1987-06-19

1989-03-21

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 40, 437 83, 437 84, 437233, 437247, 437248, 148DIG1, H01L 2132

Patent

active

048142921

ABSTRACT:
In a process of fabricating a semiconductor device, an amorphous semiconductor layer is formed on a substrate, densified by heat-treatment, and is subjected to further heat-treatment to be changed into a polycrystalline semiconductor layer. A MOS transistor can be formed using the polycrystalline semiconductor layer.

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