Process of curing hydrogen silsesquioxane coating to form silico

Details Process of curing hydrogen silsesquioxane coating to form silico Process of curing hydrogen silsesquioxane coating to form silico

1994-05-17

1995-10-10

Utech, Benjamin L.

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427573, 427574, 427226, 4273762, 427387, B05D 100, B05D 302

Patent

active

054569524

ABSTRACT:
A process is disclosed for curing a hydrogen silsesquioxane coating material to form SiO.sub.2 by first placing the coating material in a preheated furnace; igniting a plasma ignited in the furnace immediately after insertion of the coating material therein; then raising the temperature of the furnace up to a predetermined curing temperature, while still maintaining the plasma in the chamber; maintaining the coating material at the curing temperature until substantially all of the coating material has cured to form SiO.sub.2 ; and then extinguishing the plasma and cooling the furnace. In another embodiment, the coating material is cured, with or without the assistance of heat and a plasma, in an ultrahigh vacuum, i.e., a vacuum of at least 10.sup.-5 Torr or better, and preferably at least 10.sup.-6 Torr or better.

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