Process of curing hydrogen silsesquioxane coating to form silico

Details Process of curing hydrogen silsesquioxane coating to form silico Process of curing hydrogen silsesquioxane coating to form silico

1995-06-05

1996-08-27

Utech, Benjamin

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427573, 427574, 427226, 4273762, 427387, C08J 718

Patent

active

055499341

ABSTRACT:
A process is disclosed for curing a hydrogen silsesquioxane coating material to form SiO.sub.2 by first placing the coating material in a preheated furnace; igniting a plasma ignited in the furnace immediately after insertion of the coating material therein; then raising the temperature of the furnace up to a predetermined curing temperature, while still maintaining the plasma in the chamber; maintaining the coating material at the curing temperature until substantially all of the coating material has cured to form SiO.sub.2 ; and then extinguishing the plasma and cooling the furnace. In another embodiment, the coating material is cured, with or without the assistance of heat and a plasma, in an ultrahigh vacuum, i.e., a vacuum of at least 10.sup.-5 Torr or better, and preferably at least 10.sup.-6 Torr or better.

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